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Lateral p-n-p Transistors and Complementary SiC Bipolar Technology

机译:横向p-n-p晶体管和互补SiC双极技术

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摘要

Lateral p-n-p transistors and a complementary bipolar technology have been demonstrated for analog integrated circuits. Besides vertical n-p-n's, this technology provides lateral p-n-p's at the cost of one additional lithographic and dry etching step. Both devices share the same epitaxial layers and feature topside contacts to all terminals. The influence on p-n-p current gain of contact topology (circular versus rectangular), effective base width, base/emitter doping ratio, and temperature was studied in detail. In the range -40 degrees C to 300 degrees C, the current gain of the p-n-p transistor shows a maximum of similar to 37 around 0 degrees C and decreases to similar to 8 at 300 degrees C, whereas in the same range, the gain of n-p-n transistors exhibits a negative temperature coefficient.
机译:横向p-n-p晶体管和互补双极技术已被证明可用于模拟集成电路。除了垂直n-p-n,该技术还提供横向p-n-p,但需要额外的光刻和干法蚀刻步骤。两种器件共享相同的外延层,并具有与所有端子的顶侧触点。详细研究了接触拓扑(圆形与矩形)对p-n-p电流增益,有效基极宽度,基极/发射极掺杂比和温度的影响。在-40摄氏度至300摄氏度的范围内,pnp晶体管的电流增益在0摄氏度附近显示最大值,类似于37,而在300摄氏度下则减小至类似于8。 npn晶体管呈现负温度系数。

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